Download to citation(s)
S. Lee, S. Mo, Y. Lee.  A Study on Si$_3$N$_4$ Thin Film Etching Using H$_3$PO$_4$ by Using Wafer Direct Heating.  New Physics: Sae Mulli 67, 936 (2017).  https://doi.org/10.3938/NPSM.67.936
* Please select a format and type blew.
Export type
Format