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https://doi.org/10.3938/NPSM.69.124
Crystal Properties of TiO$_2$ Thin Films Grown at Low Temperatures by Reactive DC Magnetron Sputtering
New Phys.: Sae Mulli 2019; 69: 124~127
Published online February 28, 2019;  https://doi.org/10.3938/NPSM.69.124
© 2019 New Physics: Sae Mulli.

Hyeok Jee1, Jin-Soo Kim1, Hye-Won SEO*2

1 Department of Physics, Jeju National University, Jeju 63243, Korea

2 Department of Physics, Jeju National University, Jeju 63243, Korea and Jeju National University Research Institute for Basic Science, Jeju 63243, Korea

Correspondence to: hwseo@jejunu.ac.kr
Received September 11, 2018; Revised October 29, 2018; Accepted October 29, 2018.
cc This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0/) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
We grow anatase-TiO$_2$ thin films in the low-temperature range from room temperature (RT) to 300 $^\circ$C by using a reactive DC magnetron sputtering method. In particular, we focused on the dependences of the crystalline properties of TiO$_2$ thin films on the growth temperature. The crystallite size and population were found to increase with increasing temperature, which was revealed by using X-ray diffraction and Raman spectroscopic methods. Using a comparative study based on atomic force microscopy, we also identified that the crystallites in the TiO$_2$ thin films were of high quality.
PACS numbers: 61.43.-j, 68.55.-a, 81.15.Cd
Keywords: TiO$_2$, Crystallites, Growth temperature, Thin films


February 2019, 69 (2)
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