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Color Controls of TiO$_2$ Thin Films Grown on Half-Mirrored Stainless-Steel Substrates by Using the Facing Target Sputtering Method
New Phys.: Sae Mulli 2019; 69: 247~252
Published online March 29, 2019;
© 2019 New Physics: Sae Mulli.

Sung-Youp LEE1, Hyeong-Rag LEE1, Hong Tak KIM*1, Hye Jin HA2

1Department of Physics, Kyungpook National University, Daegu 41566, Korea
2Department of Science Education, Kyungpook National University, Daegu 41566, Korea
Correspondence to:
Received December 13, 2018; Revised January 23, 2019; Accepted February 11, 2019.
cc This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License ( which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
In this study, titanium oxide (TiO$_2$) thin films were deposited on stainless-steel and glass substrates by using a facing target sputtering method. As-deposited TiO$_2$ films exhibited an optical energy band-gap of 3.37 eV, a refractive index of 2.27 and an extinction coefficient of 0.19 at a wavelength of 550 nm. The color on the films was acquired by using the interference of light between the TiO$_2$ films and the reflective substrate, and also could be controlled from yellow to purple color by changing the thickness of the TiO$_2$ thin film. The above results, shown that color can be freely realized for a reflective substrate using TiO$_2$, which is relatively an environment-friendly material and that this approach can be applied in various fields requiring various color implementations.
PACS numbers: 78.20.-e, 42.70.-a, 81.05.-t
Keywords: Titanium oxide, Facing target sputtering, Optical interference

March 2019, 69 (3)
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