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https://doi.org/10.3938/NPSM.69.785
Erratum: Pattern Synthesis of Designed Graphene by using a LASER Scribing Process
New Phys.: Sae Mulli 2019; 69: 785~785
Published online July 31, 2019;  https://doi.org/10.3938/NPSM.69.785
© 2019 New Physics: Sae Mulli.

Dong Yun LEE1, ungtae NAM1, Keun Soo KIM2*

1Department of Physics, Sejong Univerity, Seoul 05006, Korea
2Department of Physics and Astronomy, Sejong Univerity, Seoul 05006, Korea
Correspondence to: kskim2676@sejong.ac.kr
cc This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0/) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
본 논문의 감사의 글을 ‘본 연구는 한국전력공사의 2018년 선정 기초연구개발 과제연구비에 의해 지원되었습니다(과제번호: R18XA06-34). This research was supported by Korea Electric Power Corporation. (Grant number: R18XA06-34)’ 로 수정합니다.


July 2019, 69 (7)
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