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https://doi.org/10.3938/NPSM.69.1116
Effects of Electron Beam Treatment on Amorphous Carbon Nitride Thin Films Grown by Using the Facing Target Sputtering Method
New Phys.: Sae Mulli 2019; 69: 1116~1122
Published online November 29, 2019;  https://doi.org/10.3938/NPSM.69.1116
© 2019 New Physics: Sae Mulli.

Sung-Youp LEE1, Hyeong-Rag LEE1, Hong Tak KIM2*, Manwoo LEE3

1Department of Physics, Kyungpook National University, Daegu 41566, Korea
2School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
3Dongnam Institute of Radiological & Medical Sciences, Busan 46033, Korea
Correspondence to: zam89blue@gmail.com
Received August 8, 2019; Revised October 7, 2019; Accepted October 10, 2019.
cc This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0/) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
In this study, amorphous carbon nitride (a-CN) films were deposited on glass substrates by using the facing target sputtering technique, and the effects of electron beam (e-beam) treatment on the a-CN films were investigated. The results of the XPS and the Raman analysis showed that the e-beam treatment seldom caused any change in bonding structure between the carbon elements. However, the value of [N]/[C+N] decreased from 18.4% to 16.7% after the treatment, and the ratio of double bonded nitrogen (N$ _{d}$, =N$-$) and triple-bonded nitrogen (N$ _{t}$, --N<) was also found to have changed. The value of [N$ _{t}$]/[N$ _{d}$ + N$ _{t}$] has decreased from 15.6\% to 8.2\%. From these results, the e-beam treatment is thought to affect strongly the chemical bonding between nitrogen and carbon. The introduction of a high-energy e-beam caused a change from N$ _{t}$ to N$ _{d}$, and some nitrogen components disappeared in the form of N$ _{2}$ gas. In conclusion, these changes play major roles in the opto-electronic properties of the films.
PACS numbers: 61.43.Er, 81.40.-z, 68.60.-p
Keywords: Amorphous carbon nitride, Facing target sputtering, Electron beam treatment


November 2019, 69 (11)
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