In this study, a LASER scribing process in a vacuum chamber was used to reduce the process time and the energy consumption significantly and pattern synthesis of graphene into the desired shape was carried out. For this purpose, a LASER-assisted

chemical vapor deposition (CVD) was used and a negative tone resist polymer film was coated onto various substrate, such as metal foil, quartz, and quartz coated with a thin metal film, to be used as a solid carbon source for graphene synthesis. On such a prepared substrate, patten synthesis of graphene by LASER ($\lambda=1064$ nm, pulse) local heating method was performed in a vacuum chamber, and each sample was evaluated by Raman spectroscopy to optimize the synthesis conditions. In the case of a metal substrate, the synthesis of patterns of graphene was difficult due to the good thermal conductivity of the metal. For the quartz substrates, the optimized conditions for graphene synthesis were a power of 1.4 W, a scan speed of 1 mm/s, a frequency of 30 kHz, and five exposures. For the quartz substrate coated with a 300 nm Ni film. The optimized conditions were a power of 1.8 W, a scan speed of 2 mm/s, a frequency of 30 kHz and one exposure.