New Physics: Sae Mulli

Aims and Scope

The origin of New Physics: Sae Mulli (NPSM, ISO abbreviation: New Phys.: Sae Mulli.): Sae Mulli (새물리 in Korean characters means ‘new physics’) is the oldest Korean pure scientific journal. It was first published in 1961 just after the Korean War by the Korean Physical Society (KPS). The primary mission of Sae Mulli was to start building up Korean physics research community from almost nothing and in fact Sae Mulli had made tremendous contributions to the Korean science community. Through a peer-review system, Sae Mulli had continued elevating the level of scientific researches, consequently becoming a cornerstone of the economic miracle of Korea...

Editor-in-Chief : Sunglae CHO
New Physics: Sae Mulli Editorial Board

pISSN : 0374-4914
eISSN : 2289-0041

Tel : +82-2-556-4737
Fax : +82-2-554-1643
E-mail: npsm@npsm-kps.org

Research Papers

Deposition Temperature-dependent Magnetic and Structural Property Variations of Co Films

Gongin LEE¹, Tae-Seong JU¹, Seojin YANG¹, Sehwan SONG¹, Jiwoong KIM¹, Sungkyun PARK*¹, Eun-Young KIM²

¹Department of Physics, Pusan National University, Busan 46241, Korea

²Department of Physics, Chonbuk National University, Jeonju 54896, Korea

A series of Co films deposited on Al$ _{2}$O$ _{3}$(0001) substrates by using DC magnetron sputtering at various deposition temperatures. For the films deposited at temperatures above 200$^{\circ}$C, the crystallinity was observed from X-ray diffraction measurements even though distinguishing between the hcp and the fcc structures was difficult. The surface roughness increased while the crystallinity improved as the deposition temperature was increased. The rocking scan also revealed improved mosaicity as the deposition temperature was increased. In-plane magnetization measurements using magneto-optic Kerr effects exhibited the unusual anisotropic behaviors of the coercivity for the films with high crystallinity. However, the saturation magnetization increased with increasing deposition temperature, indicating that the saturation magnetization was closely correlated with the crystallinity of the film.

New Phys.: Sae Mulli 2019; 69: 1135-1140

Effects of Electron Beam Treatment on Amorphous Carbon Nitride Thin Films Grown by Using the Facing Target Sputtering Method

Sung-Youp LEE¹, Hyeong-Rag LEE¹, Hong Tak KIM²*, Manwoo LEE³

¹Department of Physics, Kyungpook National University, Daegu 41566, Korea

²School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea

³Dongnam Institute of Radiological & Medical Sciences, Busan 46033, Korea

In this study, amorphous carbon nitride (a-CN) films were deposited on glass substrates by using the facing target sputtering technique, and the effects of electron beam (e-beam) treatment on the a-CN films were investigated. The results of the XPS and the Raman analysis showed that the e-beam treatment seldom caused any change in bonding structure between the carbon elements. However, the value of [N]/[C+N] decreased from 18.4% to 16.7% after the treatment, and the ratio of double bonded nitrogen (N$ _{d}$, =N$-$) and triple-bonded nitrogen (N$ _{t}$, --N<) was also found to have changed. The value of [N$ _{t}$]/[N$ _{d}$ + N$ _{t}$] has decreased from 15.6\% to 8.2\%. From these results, the e-beam treatment is thought to affect strongly the chemical bonding between nitrogen and carbon. The introduction of a high-energy e-beam caused a change from N$ _{t}$ to N$ _{d}$, and some nitrogen components disappeared in the form of N$ _{2}$ gas. In conclusion, these changes play major roles in the opto-electronic properties of the films.

New Phys.: Sae Mulli 2019; 69: 1116-1122

New Phys.: Sae Mulli 2019; 69: 1116~1219

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Research Papers

Effects of Electron Beam Treatment on Amorphous Carbon Nitride Thin Films Grown by Using the Facing Target Sputtering Method

Sung-Youp LEE, Hyeong-Rag LEE, Hong Tak KIM*, Manwoo LEE

New Phys.: Sae Mulli 2019; 69: 1116-1122 https://doi.org/10.3938/NPSM.69.1116