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eISSN 2289-0041

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Park G, Kim I, Sun H, Lee Y, Lee K, Yang J.  Properties of SiO<sub>2</sub> Thin Films Deposited by Atomic Layer Deposition in relation to Growth Temperature.  NPSM 2023;73:23-28.  https://doi.org/10.3938/NPSM.73.23
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