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Fig. 1.
(Color online) Schematic drawing of the reactor including three-zone furnace used for the growth of single crystal hexagonal Si microneedle by mixed-source HVPE method.
New Phys.: Sae Mulli 2021;71:659~666
https://doi.org/10.3938/NPSM.71.659
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New Physics: Sae Mulli
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