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Fig. 4. (Color online) (a) Changes in surface roughness and electrical resistivity caused by Ralufon#14 added to the plating electrolytes. (b) Atomic Force Microscopy (AFM) micrographs of Cu surfaces for Ralufon#14 concentrations of 0 mL/L and 2 mL/L.
New Phys.: Sae Mulli 2022;72:342~347 https://doi.org/10.3938/NPSM.72.342
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