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Fig. 4. (Color online) (a) EBSD orientation maps, (b) enlarged image of boxed area in (a) and (c) rolling direction (RD) mode EBSD maps showing the misorientation angle distribution, (d) {100} PF, (e) IPF and (f) ϕ-scan synchrotron XRD pattern of deposited Cu(111) thin films at 100 °C by ASE method. The optimized deposition temperature using ASE is around 190 °C. Diffraction peaks marked as circles with alternating colors in (d) and (f) correspond to two different crystallographic orientations in (c).
New Phys.: Sae Mulli 2022;72:812~820