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Table. 1.

Critical temperatures of YBCO thin films prepared in each growth and post-growth annealing condition.


Growth conditions
Temperature (°C) Laser fluence (J/cm2) Oxygen pressure (mTorr) Post-growth annealing Variable Tc (K)
730 1.3 500 730 °C/20 min Laser fluence (at 500 mTorr) 47
730 1.6 500 730 °C/20 min 55
730 1.8 500 730 °C/20 min 46
730 1.1 200 730 °C/20 min Laser fluence (at 200 mTorr) 45
730 1.3 200 730 °C/20 min 55
730 1.4 200 730 °C/20 min 46
730 1.8 200 730 °C/20 min 46
730 2.0 200 730 °C/20 min 39
730 1.6 500 730 °C/20 min Post-growth Annealing condition (at 500 mTorr) 55
730 1.6 500 500 °C/60 min 58
730 1.6 500 0 min 60
730 1.6 200 730 °C/20 min Post-growth Annealing condition (at 200 mTorr) 55
730 1.6 200 500 °C/60 min 53
700 1.6 500 0 min Temperature 56
730 1.6 500 0 min 61
760 1.6 500 0 min 45
730 1.6 500 470 °C/30 min 700 Torr Growth and Post-growth annealing condition (Fig. 1) 93
730 1.1 500 730 °C/30 min 500 Torr 26
730 1.6 500 500 °C/30 min 760 Torr Post-growth annealing condition (Fig. 2) 90
730 1.6 500 0 min 58
730 1.6 500 730 °C/30 min 500 Torr 55
New Phys.: Sae Mulli 2024;74:634~641 https://doi.org/10.3938/NPSM.74.634
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