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Effect of Nitrogen Plasma Treatment on Titanium Suboxide Thin Films
New Phys.: Sae Mulli 2019; 69: 1303~1307
Published online December 31, 2019;
© 2019 New Physics: Sae Mulli.

Hyeok JEE, Ji-won JANG, Hye-Won SEO*

Department of Physics, Jeju National University, Jeju 63243, Korea
Correspondence to:
Received September 16, 2019; Revised October 23, 2019; Accepted October 31, 2019.
cc This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License ( which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
We have grown titanium suboxide thin films on glass substrates by using DC magnetron sputtering methods with a Ti$_2$O$_3$ target. The deposited film was then treated with nitrogen plasma by using a capacitively coupled plasma system. We used optical emission spectroscopy to monitor the energy of the nitrogen plasma. Nitrogen flows of 20 and 60 sccm were selected in the current work, in which the 1st positive series are almost constant, but the 2nd positive and the 1st negative series vary. Through X-ray diffraction and Raman spectroscopy analyses, we identified the effect of nitrogen plasma species and their energy on the surface structure of the titanium-suboxide thin films. We found that the crystal quality was improved and the grain size was increased by plasma treatment. Especially, an elongation of the $c$-lattice parameter (contractions of $a$, $b$-lattice parameters) and a reduction of the sheet resistance were observed for a 20-sccm nitrogen flow, for which the plasma energy is comparably higher.
PACS numbers: 52.25.-Os 78.20. -e, 81.15. Cd
Keywords: Titanium suboxide, Plasma treatment, Raman spectroscopy, Plasma emission spectroscopy

December 2019, 69 (12)
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