npsm 새물리 New Physics : Sae Mulli

pISSN 0374-4914 eISSN 2289-0041
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Research Paper

New Phys.: Sae Mulli 2020; 70: 556-562

Published online July 31, 2020 https://doi.org/10.3938/NPSM.70.556

Copyright © New Physics: Sae Mulli.

Optical and Surface Characteristics of TiO$_{2}$ Thin Films Deposited by using RF Magnetron Sputtering

Bong Ju LEE1, Youn Saup YOON2, Myung Bok LEE3*

1Department of Physics, Chosun University, Gwangju 61452, Korea

2Division of Electrical and Electronic Engineering, Gwangju University, Gwangju 61743, Korea
3Division of Mechanical and Metallic Mold Engineering, Gwangju Univeristy, Gwangju 61743, Korea

Correspondence to:mblee3@gwangju.ac.kr

Received: April 29, 2020; Revised: June 12, 2020; Accepted: June 12, 2020

Abstract

Titanium dioxide (TiO$_{2}$) films were deposited on glass substrates by using RF magnetron sputtering, and their optical and surface properties were investigated according to the sputtering process condition. Variations in the crystal structure, surface morphology, optical spectra, and hydrophilicity of the films were characterized with changing O$_{2}$ partial pressure in an ambient gas. The grown films were amorphous, and their surface roughness decreased with increasing of O$_{2}$ partial pressure. Partial substitution of O$_{2}$ for Ar increased the optical transmittance and decreased the reflection in the wavelength range of visible light. The hydrophilicity of the film’s surface decreased with increasing O$_{2}$ partial pressure, which was considered to be the cause of the variation in the film’s surface roughness.

Keywords:  ,RF Magnetron Sputtering, TiO$_{2}$ Thin Film, Surface Morphology, Optical Transmittance, Hydrophoicity

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