npsm 새물리 New Physics : Sae Mulli

pISSN 0374-4914 eISSN 2289-0041
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Article

Research Paper

New Physics: Sae Mulli 2006; 52: 205-210

Published online February 1, 2006

Copyright © New Physics: Sae Mulli.

Formation and Mechanical Properties of Ni-SiC Composite Films Deposited by Using Electrodeposition

전착법에 의한 Ni-SiC 복합도금의 형성 및 기계적 특성

P. Y. KIM1 and H. G. KIM1*, W. N. MYUNG2

1Department of Physics Education, Chosun University, Kwangju 501-759
2Department of Physics, Chonnam National University, Kwangju 500-757

Correspondence to:hgakim@chosun.ac.kr

Abstract

The dependencies of the formation and mechanical properties of Ni-SiC composite films on current density, pH, stirring time, and rotation speed were investigated. The SiC content in the Ni-SiC composite films increased with increasing rotation speed and deposition time up to 200 rpm. The hardness of the Ni-SiC composite films was shown to be higher than that of pure electro-deposited Ni. The hardness of the Ni-SiC composite films was measured to be as high as 2.5 A/dm$^2$ in the low-current-density region (current density ? 5 A/dm$^2$) and 15 A/dm$^2$ in the high-current-density region (current density ? 5 A/dm$^2$). The hardness of the Ni-SiC composite films had as a maximum value of 1350 ± 80 VHN at pH 3.5 and 15 A/dm$^2$. The strain of the Ni-SiC composite films was less than that of Ni films, and, in general, decreased gradually with increasing current density.

Keywords: Electrodeposition, Ni-SiC composite film, Hardness, Strain

Ni-SiC 복합도금의 전류밀도별, pH별, 교반속도별에 따라 형성하여 역학적 특성을 조사하였다. Ni-SiC 복합도금에 SiC 양은 교반속도가 200rpm 까지 증가하였고 경도는 순수 Ni 도금 때 보다 높게 측정되었으며, 특히 5 A/dm$^2$이하의 저전류밀도영역에서는 2.5 A/dm$^2$에서 높은값이 측정되었고 5 A/dm$^2$이상의 고전류밀도영역에서는 15 A/dm$^2$ 에서 높은값의 경도가 측정되었다. Ni-SiC 복합도금의 최대 경도값은 pH는 3.5에서 전류밀도는 15 A/dm$^2$에서 1350 $\pm$ 80 VHN 값이 나왔다. 변형률은 전류밀도가 증가함에 따라 일반 Ni 박막 보다 작아지는 경향을 보이고 있다.

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