npsm 새물리 New Physics : Sae Mulli

pISSN 0374-4914 eISSN 2289-0041


Research Paper

New Phys.: Sae Mulli 2018; 68: 781-787

Published online July 31, 2018

Copyright © New Physics: Sae Mulli.

Dependences of the Optical and the Electrical Properties of 50 nm Thick Copper Films Deposited by Using an Electron Beam Evaporator on the Evaporator's Vacuum Conditions

Hyoung-Taek LEE, In-Hee LEE, Hyeong-Ryeol PARK*

Department of Physics, Chungbuk National University, Cheongju 28644, Korea


Received: April 12, 2018; Revised: June 11, 2018; Accepted: June 14, 2018

This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License ( which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.


Techniques to make metal films thinner and better remain an unexplored area of ​​research that still has important technical problems. In particular, the fabrication of metal films is widely encountered in the field of nano-optics, and various surface plasmon phenomena, including light focusing, have been observed more in metal films with better conductivities. Here, we investigated how the qualities of the metal thin films were changed by varying the deposition conditions in an electron beam evaporator. We analyzed the metal films by using electrical and optical methods. In fact, the pumping time of the vacuum chamber had a greater effect on the quality of the metal film than the difference in the lowest vacuum pressure. For the production of a metal film with a conductivity as good as that for the bulk, an electron beam evaporator having a loading chamber in addition to a main chamber in which the vacuum pressure is always kept to a minimum value as low as 10$^{-10}$ torr is required. 

Keywords: Thin film, Metal deposition, Resistivity, Electron beam evaporator, Spectroscopy

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